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平面靶板

[ 信息发布:本站 | 发布时间:2017-03-17 | 浏览:191次 ]



纯金属及金属合金溅射靶材列表


溅射靶材主要应用于电子及信息产业,如集成电路、信息存储、液晶显示屏、激光存储器、电子控制器件等;亦可应用于玻璃镀膜领域;还可以应用于耐磨材料、高温耐蚀、高档装饰用品等行业。

分类

根据形状可分为长靶,方靶,圆靶,异型靶

根据成份可分为金属靶材、合金靶材、陶瓷化合物靶材

根据应用领域分为微电子靶材、磁记录靶材、光碟靶材、贵金属靶材、薄膜电阻靶材、导电膜靶材、表面改性靶材、光罩层靶材、装饰层靶材、电极靶材、封装靶材、其他靶材


Product Name

Element Symbol

purity

shape

Titanium Sputtering Target

Ti

2N5,4N,5N

Planar target, Rotary target

Nickel Sputtering Target

Ni

2N5, 3N

Planar target, Rotary target

Zirconium Sputtering Target

Zr

2N5

Planar target, Rotary target

Aluminum Sputtering Target

Al

5N 6N

Planar target, Rotary target

Copper Sputtering Target

Cu

3N5,4N

Planar target, Rotary target

Tungsten Sputtering Target

W

3N5

Planar target, Rotary target

Molybdenum Sputtering Targets

Mo

3N5

Planar target, Rotary target

Tantalum Sputtering Target

Ta

3N5, 4N

Planar target, Rotary target

Niobium Sputtering Target

Nb

3N5, 4N

Planar target, Rotary target

Cobalt Sputtering Target

Co

3N5 3N8

Planar target, Rotary target

Chromium Sputtering Target

Cr

3N5

Planar target, Rotary target

Titanium Aluminum Sputtering Target

Ti + Al

2N5

Planar target, Rotary target

Molybdenum Niobium Sputtering Target

Mo+Nb

3N5

Planar target, Rotary target

Tungsten Molybdenum Sputtering Target

W+Mo

3N5

Planar target, Rotary target

NiobiumZirconium Sputtering Target

Nb+Zr

3N5

Planar target, Rotary target